功率MOSFET
材料科学
平面的
MOSFET
光电子学
功率半导体器件
晶体管
硅
电气工程
垂直的
栅氧化层
功率(物理)
场效应晶体管
电场
工程类
电压
物理
计算机科学
计算机图形学(图像)
量子力学
数学
几何学
作者
K. Muthuseenu,Hugh J. Barnaby,K.F. Galloway,A. E. Koziukov,Т. A. Maksimenko,Mikhail Yu. Vyrostkov,K. B. Bu-Khasan,А. А. Калашникова,A. Privat
标识
DOI:10.1109/tns.2021.3053168
摘要
This article compares and analyzes the single-event gate rupture (SEGR) response of silicon planar gate super-junction (SJ) power metal oxide semiconductor field effect transistors (MOSFETs) and vertical double diffused power MOSFETs (VDMOSs). When an incident heavy-ion strike is perpendicular to the gate oxide, the SEGR tolerances of SJ power MOSFETs (SJMOSs) and VDMOSs are similar. But, for heavy-ion strikes that are at different angles, SJMOS has better SEGR tolerance than VDMOS. This improved performance of SJMOS is due to the presence of an additional horizontal electric field component in SJMOS devices. This is validated using the experimental data and simulation results in this article.
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