Physical Adsorption and Charge Transfer of Molecular Br2 on Graphene

石墨烯 拉曼光谱 单层 材料科学 吸附 密度泛函理论 分子 化学物理 分析化学(期刊) 物理化学 化学 计算化学 纳米技术 有机化学 光学 物理
作者
Zheyuan Chen,Pierre Darancet,Lei Wang,Andrew C. Crowther,Yuanda Gao,Cory R. Dean,Takashi Taniguchi,Kenji Watanabe,James Hone,Chris A. Marianetti,Louis E. Brus
出处
期刊:ACS Nano [American Chemical Society]
卷期号:8 (3): 2943-2950 被引量:63
标识
DOI:10.1021/nn500265f
摘要

We present a detailed study of gaseous Br2 adsorption and charge transfer on graphene, combining in situ Raman spectroscopy and density functional theory (DFT). When graphene is encapsulated by hexagonal boron nitride (h-BN) layers on both sides, in a h-BN/graphene/h-BN sandwich structure, it is protected from doping by strongly oxidizing Br2. Graphene supported on only one side by h-BN shows strong hole doping by adsorbed Br2. Using Raman spectroscopy, we determine the graphene charge density as a function of pressure. DFT calculations reveal the variation in charge transfer per adsorbed molecule as a function of coverage. The molecular adsorption isotherm (coverage versus pressure) is obtained by combining Raman spectra with DFT calculations. The Fowler-Guggenheim isotherm fits better than the Langmuir isotherm. The fitting yields the adsorption equilibrium constant (∼0.31 Torr(-1)) and repulsive lateral interaction (∼20 meV) between adsorbed Br2 molecules. The Br2 molecule binding energy is ∼0.35 eV. We estimate that at monolayer coverage each Br2 molecule accepts 0.09 e- from single-layer graphene. If graphene is supported on SiO2 instead of h-BN, a threshold pressure is observed for diffusion of Br2 along the (somewhat rough) SiO2/graphene interface. At high pressure, graphene supported on SiO2 is doped by adsorbed Br2 on both sides.
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