Effect of electric field configuration on EUV-induced plasma dynamics

Abstract The configuration of external electric fields generated by electrostatic chucks plays a critical role in plasma dynamics during extreme ultraviolet lithography, yet the underlying coupling mechanisms are still not fully understood. This study employs first-principles particle-in-cell simulations to investigate how the field topology of electrostatic chucks and the location of EUV irradiation regulate the kinetics of a transient hydrogen plasma. Results demonstrate that strong fields of electrostatic chucks govern the plasma dynamics by controlling the evolution of the space potential, which in turn regulates charged particle energy distributions and surface bombardment characteristics. Specifically, symmetric bipolar electrodes establish a global potential gradient that promotes sustained ion acceleration and broadens the electron energy distribution. In contrast, pitch-shaped electrodes produce a localized periodic field that predominantly affects near-surface particle dynamics. These findings clarify the key coupling mechanisms between electric field geometry and EUV-induced plasma behavior, offering vital insights for mitigating plasma-induced damage and improving process stability in lithography systems.