氮化钛
钛
材料科学
溅射
氮化物
冶金
纳米技术
薄膜
图层(电子)
作者
Nguyễn Duy Cường,Pham Thi Mai Phuong,Van‐Dang Tran,Dang Minh Duc,Duong Van Thiet,Vuong‐Hung Pham
标识
DOI:10.1002/vjch.202400068
摘要
Abstract In this study, the titanium nitride (TiN) films were deposited on Ti substrates using DC reactive sputtering. The structure and morphology of the TiN films were analyzed by X‐ray diffraction, scanning electron microscopy, energy dispersive X‐ray spectroscopy, X‐ray photoelectron spectrometry and Auger electron spectroscopy. In vitro biocompatibility of the TiN films was evaluated using scanning electron microscopy and a confocal electron scanning microscope. The results show that TiN films have been successfully formed, hardness and in vitro biocompatibility have been improved compared to that of Ti substrates.
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