High throughput fabrication of surface gratings on VCSEL using displacement Talbot lithography

In this paper, surface grating Vertical Cavity Surface Emitting Laser(VCSEL) are fabricated by displacement Talbot lithography (DTL) exposure technology, and the effects of process parameters and anti-reflection layers on the quality of fabricated surface grating VCSEL are systematically studied. The experimental results show that this process can fabricate surface grating VCSEL with a depth of 20-150 nm. When the exposure dose is 30 mJ·cm^-2, the exposure light intensity is 2 mW·cm^-2, and the developing time is 1 min, the results that meet the experimental requirements are obtained. The experimental results show that the method of surface grating VCSEL fabricated by DTL exposure technology can replace EBL exposure technology. It is of great significance to improve the performance of VCSEL.