A comprehensive evaluation of vat-photopolymerization resins and alumina slurries for ceramic stereolithography

Ceramic slurries play an essential role in the fabrication of complex ceramic parts in ceramic stereolithography (CSL), among which photosensitive monomers is the focus. In this study, the comprehensive properties of commonly used monomers were quantitatively studied by a new evaluation system. As a result, ACMO, PONPGDA and EOTMPTA were selected as the final three monomers with better properties. On this basis, an optimal combination of the above monomers with the best comprehensive performance was obtained by blending them at a ratio of 60:60:40. Next, the influence of different resins on the properties of alumina slurries was investigated. It was found that using the mixture of the above three monomers, an excellent as-prepared slurry with low viscosity, small shrinkage and good photo-curable ability was obtained.