Theoretical and Experimental Analysis on Magnetron Sputtering Film Thickness Distribution

Thickness uniformity of film influences the properties of deposit films greatly by using magnetron sputtering. A magnetron sputtering model is developed , film thickness distribution is got by theoretical deduction, and the data is analyzed by Matlab and Mathematica. The result shows that film thickness is the function of radius, and the uniformity is connected to time. The related experiment was conducted and corresponded with the theory.