铝
材料科学
渗氮
氮化铝
氮化物
氧化铝
冶金
X射线光电子能谱
镁
氧化物
复合材料
图层(电子)
化学工程
工程类
作者
Damon Kent,G. B. Schaffer,John Drennan
出处
期刊:Materials Science Forum
日期:2007-10-02
卷期号:561-565: 571-575
被引量:5
标识
DOI:10.4028/www.scientific.net/msf.561-565.571
摘要
A new nitriding method has been devised which requires only a simple vacuum furnace and enables direct nitridation of solid aluminium without any prior surface treatment. It can be used to produce thick aluminium nitride surface layers on aluminium, under nitrogen at atmospheric pressure. A critical element of the process is the use of a magnesium vapour source that reduces/disrupts the natural, protective oxide film on the aluminium surface and facilitates nitriding. The nitride surface layers form through two distinct modes, one growing outward from the aluminium plate surface and the other growing into the aluminium. Studies of the nitride layers utilizing optical microscopy, TEM, SEM, XRD and XPS have been conducted. Details of the composition, structure and growth as well as possible mechanisms for the nitride formation are presented. Understanding of the reaction may have important implications for the production of wear resistant coatings on bulk Al as well as for the production of Al/AlN composites.
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