碳化硅
材料科学
肖特基势垒
宽禁带半导体
硅
电荷(物理)
肖特基二极管
凝聚态物理
金属半导体结
光电子学
碳化物
物理
冶金
二极管
量子力学
作者
Fayssal Mekaret,Abdelaziz Rabehi,Baya Zebentout,S. Tizi,Abdelmalek Douara,Stefano Bellucci,Mawloud Guermoui,Z. Benamara,El‐Sayed M. El‐kenawy,Marwa M. Eid,Amel Ali Alhussan
出处
期刊:AIP Advances
[American Institute of Physics]
日期:2024-11-01
卷期号:14 (11)
被引量:6
摘要
This study undertakes a comparative analysis of Schottky diodes using three prominent SiC polytypes (3C, 4H, and 6H). The comparison involves meticulous calculations of the Schottky barrier resulting from the metal/SiC interface for each polytype assessed in both practical and theoretical scenarios. Specifically, the barrier height (ΦB) is systematically plotted against the metal work function (ΦM) across a range of metal work functions from 3.65 to 5.65 eV. Furthermore, the investigation extends to the saturation currents of three distinct charge transport models for each SiC polytype: thermionic current (TE), thermionic field emission, and field emission. Initial analyses plot saturation currents as a function of concentration within a temperature range of 100–500 K. Subsequent examinations plot saturation currents as a function of temperature across a concentration gradient from 1014 to 1020 cm−3. The comparison between the activation energy and thermal energy at standard room temperature (T = 300 K) yielded results consistent with theoretical predictions, affirming the robustness and applicability of each model within its dominant range.
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