超晶格
铁电RAM
材料科学
双层
光电子学
堆栈(抽象数据类型)
极化(电化学)
非易失性存储器
电子工程
纳米电子学
逻辑门
硅
二极管
砷化镓
原子层沉积
宽禁带半导体
纳米技术
作者
Kuan-Wen Huang,Kun-Tao Lin,Shu-Chieh Chang,Yu Yun Wang,Tien-Sheng Chao
标识
DOI:10.1109/led.2025.3640105
摘要
A bilayer superlattice (SL) HfxZr1-xO2 (HZO) stack is developed to combine the high endurance of low-temperature ALD (LTD) with the strong polarization benefits of high-temperature ALD (HTD). The optimized 5-nm HTD-SL/5-nm LTD-SL (HLTD) configuration demonstrates wake-up-free switching and suppressed fatigue. The resulting FeCAPs enable 3-bit/cell functionality with eight well-separated and stable polarization states sustained beyond 108 cycles. These findings indicate that the proposed bilayer SL-HZO architecture holds strong potential for high-density embedded FeRAM applications.
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