光学
衍射
衍射光栅
材料科学
栅栏
等腰三角形
衍射效率
闪耀光栅
干扰(通信)
菲涅耳衍射
严格耦合波分析
流离失所(心理学)
声光
空间滤波器
物理
旋转编码器
蚀刻(微加工)
编码器
重复性
摄影术
杂散光
分束器
光学滤波器
折射率
光电子学
作者
Dong Niu,Xunhan Wang,Li Tian,Jingzhi Su,Bangdao Chen,Shu‐Wei Ren,Guojun Li,Weitao Jiang,Yongsheng Shi,Lei Yin,Hongzhong Liu
出处
期刊:Optics Letters
[Optica Publishing Group]
日期:2025-10-27
卷期号:50 (23): 7187-7187
摘要
High-order diffraction is preferred to nanoscale displacement measurement by linear optical encoder. The diffraction efficiency at high orders, however, is limited. In this Letter, a high-order diffraction grating with an isosceles triangle profile in cross-section is proposed, and it could achieve over 40% in the diffraction efficiency of the ±4th order. Fabricated by anisotropic etching of Si (100) and followed by replication, the grating period is 4.82 μm and the symmetrical side angle for diffraction is 46.1°. Experiments indicate that, by the interference of ±4th order (optical subdivision is 8 times), the positioning accuracy in 1 mm travel length is 37.1 nm, the repeatability is 3.7 nm, and the stability is 3.6 nm @ 60 s, which are measured by the standard deviation (σ).
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