Laser‐Assisted Photopolymerization Patterning of Perovskite‐Polyurethane Acrylate Composites

Abstract Perovskite quantum dots (PQDs) are promising for luminescent materials in next generation displays due to their exceptional optoelectronic properties. However, their inherent instability and incompatibility with conventional photolithography impede further device development. Here, A laser direct lithography (LDL) strategy utilizing a PQD‐Polyurethane acrylate (PUA) composite is demonstrated. This composite ensures PQD stability under harsh solvent environments and laser irradiation, while the laser patterning process eliminates the requirement for photomasks. Using this technique, diverse patterns are successfully fabricated, including monochromatic dot matrices and monolithic multicolor patterns, ranging from features with a 50 µm pitch to large area arrays (4 × 4 cm). Crucially, the composite retains the pristine PQDs' luminescent efficiency while exhibiting superior water stability and flexibility. This work establishes a novel pathway for mask‐free direct lithography of PQDs, expanding their potential in integrated optoelectronic devices.