Deposition of Mo Films by Ion Beam Assisted Excimer Laser PVD Method

Mo films were deposited by an excimer laser ablation method under different conditions of laser fluences and target-substrate distances. Their surface morphology was observed with scanning electron microscopy (SEM). We also examined the adhesion of Mo films deposited on the substrate with an ion beam preirradiation. Spectroscopy of Mo plume was carried out. The main results obtained are as follows.(1)The adhesion of the Mo films is improved by ion beam irradiation which removes thin surface layer on a substrate.(2)Smooth surface of Mo films without droplet is successfully formed under the conditions of laser fluences of less than 0.25 MJ/m2, target-substrate distances of longer than 40 mm, and with a target rotation.(3)Mo films with a b.c.c. structure show the (110) preferred orientation of 〈110〉.(4)Mo plume generated by laser ablation is in an excited state containing Mo+.