Study of Schottky barriers on n-type GaN grown by LP-MOCVD
作者
J. D. Guo,Ming Feng,Fu‐Ming Pan
标识
DOI:10.1109/icsict.1995.503335
摘要
The Schottky barrier height of metals (Pt, Pd, Au, Ni, and Ti) on n-GaN has been measured by C-V and J-T methods. Comparison of the Schottky characteristics of those metals are discussed. Ni on GaN does not follow the rule of S=1 for GaN. The metal work function of Ni is high but the Schottky barrier height is low. The metal work function of Ag is about 4.26 eV, but the Schottky barrier height is about 1.2 eV. We think that it is because the interactions between the metal and the semiconductor dominate the Schottky behavior.