X射线光电子能谱
聚酰亚胺
胶粘剂
粘附
材料科学
氮化硅
复合材料
表征(材料科学)
失效模式及影响分析
化学工程
纳米技术
图层(电子)
工程类
作者
Rajesh G. Narechania,James A. Bruce,Sherrill A. Fridmann
摘要
The effects of surface treatments and cure temperature on polyimide to silicon nitride adhesion strength are discussed. Results show the importance of surface cleanliness and the requirement for an adhesion promoter. X‐ray photoelectron spectroscopy (XPS) was used to study the mode of failure at different cure temperatures. As the cure temperature is increased, the mode of failure goes from primarily cohesive to a mixed adhesive/cohesive failure, as inferred from the XPS data.
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