电解
吸附
催化作用
铜
电流(流体)
电流密度
化学工程
材料科学
化学
无机化学
电极
工作(物理)
羧酸盐
冶金
润湿
导电体
光谱学
多相催化
作者
Mingwei Fang (9570215),Meiling Wang (808623),Zewen Wang (11113699),Zixuan Zhang (6957035),Haochen Zhou (6686477),Liming Dai (1268553),Ying Zhu (90057),Lei Jiang (73366)
出处
期刊:
[Figshare (United Kingdom)]
日期:2023-05-11
标识
DOI:10.1021/jacs.3c02399.s001
摘要
Copper (Cu) is the only known material that can efficiently\nelectrocatalyze\nCO<sub>2</sub> to value-added multicarbon products. Owing to the instability\nof the Cu<sup>δ+</sup> state and microscopic structure in reactions,\nCu catalysts are still facing big challenges with low selectivity\nand poor durability, particularly at high current densities. Herein,\nwe report a rational one-step surface coordination approach for the\nsynthesis of Cu dendrites with an ultrastable Cu<sup>δ+</sup> state and hydrophobicity (Cu CF), even after exposure to air for\nover 6 months. As a result, Cu CF exhibited a C<sub>2</sub> FE of\n90.6% at a partial current density of 453.3 mA cm<sup>–2</sup> in a flow cell. A 400 h stable electrolysis at 800 mA and even a\nground-breaking stable operation at a large industrial current of\n10 A were achieved in the membrane electrode assembly (MEA) form.\nWe further demonstrated a continuous production of C<sub>2</sub>H<sub>5</sub>OH solution with 90% relative purity at 600 mA over 50 h in\na solid-electrolyte reactor. Spectroscopy and computation results\nsuggested that Cu(II) carboxylate coordination species formed on the\nsurface of Cu CF, which ensured the stability of the Cu<sup>δ+</sup> state and hydrophobicity. As a result, rich active sites and a stable\nthree-phase interface on the catalyst surface were achieved, along\nwith the optimized *CO adsorption strength and adsorption configuration.\nThe mixed *CO adsorption configurations on Cu CF made the *CO dimerization\nprocess easier, which promoted the conversion of CO<sub>2</sub> to\nC<sub>2</sub> products. This work provides a promising paradigm for\nthe design and development of Cu-based catalysts with ultrahigh stability\nunder industrial current densities.
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