材料科学
变阻器
降级(电信)
兴奋剂
测距
击穿电压
复合材料
光电子学
电压
电子工程
电气工程
计算机科学
电信
工程类
作者
Yumeng Zheng,Takuya Maegawa,Yuuki Sato,Shinzo Yoshikado
标识
DOI:10.1016/j.jeurceramsoc.2024.06.008
摘要
A simple ZnO varistor with high resistance to electrical degradation and an adjustable breakdown voltage range of 100–3000 V/mm was developed by adding SiO2 and B2O3 to Bi–Mn–Co-doped ZnO. Samples were fabricated by sintering at 1150 ºC and doped with 0–55 mol% SiO2 to adjust breakdown voltage. High nonlinear index and low leakage current density were confirmed with addition of SiO2; however, severe electrical degradation occurred. Addition of 1 mol% B2O3 successfully improved the resistance to electrical degradation and long-term reliability, due to the formation of homogenous glass-phase Bi–B–O at grain boundaries inhibiting ion migration. A stabilized interface trap with ∼0.6 eV and 10−21 (m2) was found in samples with 1 mol% B2O3.
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