化学
皮肤癌
防晒系数
皮肤护理
纳米技术
紫外线辐射
皮肤病科
有机化学
癌症
放射化学
材料科学
医学
内科学
作者
Vijay R. Gadgil,Aarya Darak,Shubham J. Patil,Abhinandan Chopada,Revati A. Kulkarni,Sharvari M. Patil,Nupur A. Gupta,Tanmay N. Mehta,Shreerang V. Joshi
标识
DOI:10.1016/j.jics.2022.100858
摘要
Excessive exposure of UV radiation from the sunlight to human skin is dangerous and causes various skin disorders including skin cancer. Dermatologists worldwide recommend use of skin creams/lotions containing UV-filters/sunscreens for protection from such harmful effects. There is continuous evolution and development of new organic, inorganic and hybrid sunscreens which are being used in such skin care preparations. In the recent past it has been seen that some of these materials are not stable to UV light and the sun protection offered by them decreases rapidly with time. Therefore, most of the formulators now prefer photostable sunscreens or the formulations are designed in such a way that they provide inherent photostability. In this review, we have covered the chemistry of synthesis of different organic sunscreens, issues related to photostability of some of them, and different approaches used to enhance their photostability.
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