X射线光电子能谱
溅射
辐照
氩
聚合物
材料科学
分析化学(期刊)
离子
光电发射光谱学
离子束
聚苯乙烯
星团(航天器)
薄膜
原子物理学
化学
化学工程
纳米技术
有机化学
复合材料
物理
工程类
核物理学
程序设计语言
计算机科学
作者
Andrzej Bernasik,Jakub Haberko,Mateusz Marzec,Jakub Rysz,W. Łużny,Andrzej Budkowski
出处
期刊:Journal of vacuum science and technology
[American Vacuum Society]
日期:2016-03-16
卷期号:34 (3)
被引量:7
摘要
In this work, the authors examine chemical stability of polymers under x-ray photoemission spectroscopy (XPS) depth profiling coupled with argon gas cluster ion sputtering. The depth profiles measured for polystyrene, poly(3-dodecylthiophene), and poly(methyl methacrylate) thin films do not reveal changes in the XPS spectra due to cluster bombardment. Nevertheless, x-ray irradiation influences the shape of the sputter craters. The observed features are attributed to cross-linking or chain scission occurring in the polymers.
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