Self‐Templating Approaches to Hollow Nanostructures

Abstract This current research progress on the fabrication of hollow nanostructures by using self‐templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self‐templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution–regrowth, and the surface‐protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented.