A.D. Apostol,V. Damian,F. Garoi,Iuliana Iordache,C. Logofatu,Victor Nascov,Adrian Sima,B. Dana Cristea,R. Müller
标识
DOI:10.1109/smicnd.2006.283955
摘要
Interference or holographic lithography seems to be the most studied lithographic technique today for obtaining large area of symmetric patterns as a result of the interference of two, three, four or more beams of different shape or structures. Simulated and corresponding real fringe patterns are presented