哈梅克常数
材料科学
表面粗糙度
悬臂梁
表面光洁度
接触角
无定形固体
原子力显微镜
蓝宝石
常量(计算机编程)
曲面(拓扑)
复合材料
数学
光学
纳米技术
范德瓦尔斯力
化学
几何学
计算机科学
物理
结晶学
有机化学
分子
程序设计语言
激光器
范德瓦尔斯半径
作者
Michael Stevenson,Stephen P. Beaudoin,David S. Corti
标识
DOI:10.1021/acs.jpcc.3c01623
摘要
A robust experimental validation of an existing approach-to-contact atomic force microscopy (AFM) method for determining the self-Hamaker constant, A11, of a solid, nondeformable material is presented. By explicitly accounting for the underlying surface roughness of a given substrate, this method allows for an estimate of A11 to be obtained from the resulting distribution of AFM cantilever deflections at first contact with the surface, dc. Using this method, the self-Hamaker constants of amorphous silica, stainless steel, and sapphire were determined. Moreover, several plates comprised of the same material, but with different topographies (or values of their root-mean squared surface roughness), were also considered. The values of A11 obtained for these same material plates were found to be in excellent agreement, verifying that this approach-to-contact method properly accounts for the underlying roughness of a given surface. Furthermore, the average value of A11 across all plates for a particular material was in very good agreement with those results previously derived from Lifshitz theory. Finally, the uncertainties in these experimental estimates of A11 were found to be significantly reduced, compared to the uncertainties that arose in some previous approach-to-contact methods.
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