Microwave-excited atmospheric pressure plasma jet with wide aperture for the synthesis of carbon nanomaterials

Atmospheric pressure chemical vapor deposition (APCVD) has preferable properties to the mass production of carbon nanomaterials. Here, we describe a specially-designed microwave-excited atmospheric pressure plasma jet (MW-APPJ) with a 10-mm-wide nozzle based on microstrip line. The MW-APPJ is applied to an APCVD process and nanocrystalline diamond films are successfully deposited on silicon substrates using a mixture gas of Ar/CH4/H2 even in ambient air. The MW-APPJ technology could be suitable for the large-area APCVD system for the synthesis of carbon nanomaterials due to its arrayed configuration for the enlargement of plasma area.