瞬态(计算机编程)
高电子迁移率晶体管
物理
电气工程
光电子学
拓扑(电路)
材料科学
晶体管
计算机科学
电压
量子力学
工程类
操作系统
作者
Jong‐Ho Bae,Sun-Kyu Hwang,Jongmin Shin,Hyuck‐In Kwon,Chan Hyeong Park,Hyoji Choi,Jong-Bong Park,Jongseob Kim,Jong‐Bong Ha,Kiyeol Park,Jaejoon Oh,Jaikwang Shin,U‐In Chung,Kwang-Seok Seo,Jong‐Ho Lee
标识
DOI:10.1109/iedm.2013.6724733
摘要
Trap-related transient characteristics and RTN in p-GaN gate HEMT were characterized, for the first time to our knowledge. Current conduction mechanism in DC I G is explained based on proposed model. Hopping conduction mechanism is responsible for I G at V G < 0. I G at V G > 0 seems to be controlled by thermionic emission and affected by the action of floating-base n(W)-p(p-GaN)-n(AlGaN/GaN) bipolar transistor. Transient current behavior is related to the DC conduction mechanism and could be explained by thermal emission and charge trapping in p-GaN and AlGaN layers. Measured transient behavior of gate capacitance corresponds to that of the transient currents. Hole trapping into the AlGaN layer and existence of percolation path in gate and drain currents are verified by analyzing RTNs in I G and I D . Trap position and activation energy regarding RTN are firstly extracted. RTN time constants are similar to those in I G and I D transient behavior.
科研通智能强力驱动
Strongly Powered by AbleSci AI