P‐206L: Late‐News Poster : High Performance As‐Deposited Microcrystalline Silicon TFT using High‐Density Microwave Plasma Source

Abstract We developed high performance as‐deposited microcrystalline TFT. The microcrystalline silicon was deposited by novel MSEP (Metal Surface microwave Excitation Plasma)‐CVD with high deposition rate of over 20 nm/min and its crystalline ratio was over 70 %. TFT showed high mobility of 1.3 cm 2 /Vs.