The Working Principle of Double Beam Focused Ion Beam and its Application in the Field of Microelectronics

Focus ion beam(FIB) has been more and more important in the field of microelectronics because of its micro-fabrication and analysis ability.As the development of focus ion beam system,dual beam FIB has been widely applied in the much field.Dual beam FIB system combines the advantages of high energy ion beam and electron beam.It can apply liquid gallium ion source through the high pressure emitting ion beam for realizing the sample processing,and use high-energy electron beam scanning sample images.It can process and observation simultaneously.This paper introduces the composition and the main components function of duel FIB and some applications in the field of microelectronics,such as preparing cross section,transmission electron microscopy(TEM) sample preparation,and circuit repair,and details the main operation method of these applications.