铋
俄歇电子能谱
分析化学(期刊)
薄膜
氮气
分子束外延
材料科学
外延
光谱学
晶格常数
图层(电子)
化学
衍射
冶金
纳米技术
光学
物理
有机化学
核物理学
量子力学
色谱法
作者
Ashok K. Shrestha,Ali Abbas,David C. Ingram,Arthur R. Smith
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2024-01-18
卷期号:42 (2)
被引量:2
摘要
We attempted to grow a thin film of BiN by co-deposition of bismuth and nitrogen on rock-salt structure MgO (001) substrates. Furthermore, we studied the effect of variation of the growth temperature and the nitrogen to bismuth flux ratios on sample growth. For the samples grown and conditions used, we do not find strong evidence for the formation of a bulk Bi-N alloy. Even for very high nitrogen to bismuth flux ratio, we observed only bismuth and no nitrogen using bulk Rutherford back-scattering spectroscopy measurements, and only 1%–2% nitrogen was seen through surface Auger electron spectroscopy measurements. The in-plane lattice measurements show that the resulting Bi (110) samples are strained, which is presumably caused by lattice mismatch between the sample and the substrate when grown without any buffer layer. The use of a high-temperature buffer layer helps to release strain in the sample but only along one axis. Measurements of the atomic layer spacing using x-ray diffraction and also scanning tunneling microscopy confirm the Bi (110) thin film sample structure.
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