Lv4
446 积分 2024-03-10 加入
Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography
1个月前
已完结
Three-Dimensional Nanopatterning Using Extreme Ultraviolet Colloidal Talbot Lithography
4个月前
已完结
One metric to rule them all: new k4 definition for photoresist characterization
5个月前
已完结
Contacts and lines SEM image metrology with SMILE
5个月前
已完结
Reconstructing the three-dimensional latent image of extreme ultraviolet resists with resonant soft x-ray scattering
5个月前
已完结
Shot noise limit of chemically amplified resists with photodecomposable quenchers used for extreme ultraviolet lithography
5个月前
已完结
Image blur investigation using EUV-interference lithography
5个月前
已完结
Extreme ultraviolet lithography
5个月前
已完结
Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists
5个月前
已完结
Nonlinear propagation effect in x-ray parametric amplification during high harmonic generation
5个月前
已关闭
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