Lv4
428 积分 2024-03-10 加入
Three-Dimensional Nanopatterning Using Extreme Ultraviolet Colloidal Talbot Lithography
2个月前
已完结
One metric to rule them all: new k4 definition for photoresist characterization
2个月前
已完结
Contacts and lines SEM image metrology with SMILE
2个月前
已完结
Reconstructing the three-dimensional latent image of extreme ultraviolet resists with resonant soft x-ray scattering
3个月前
已完结
Shot noise limit of chemically amplified resists with photodecomposable quenchers used for extreme ultraviolet lithography
3个月前
已完结
Image blur investigation using EUV-interference lithography
3个月前
已完结
Extreme ultraviolet lithography
3个月前
已完结
Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists
3个月前
已完结
Nonlinear propagation effect in x-ray parametric amplification during high harmonic generation
3个月前
已关闭
Integrated Generation and Manipulation of Microcapsules via Optically Induced Dielectrophoresis
4个月前
已完结
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