Lv31
230 积分 2023-08-19 加入
Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition
1小时前
待确认
Chemical vapour deposition of thin-film dielectrics
12天前
已关闭
A kinetics and transport model of dichlorosilane chemical vapor deposition
14天前
已完结
Deposition Uniformity Control in a Commercial Scale HTO-CVD Reactor
14天前
已完结
Simulation of the step coverage for chemical vapor deposited silicon dioxide
15天前
已完结
Silicon nitride chemical vapor deposition from dichlorosilane and ammonia: theoretical study of surface structures and reaction mechanism
15天前
已完结
Atomistic modeling of chemical vapor deposition: silicon nitride CVD from dichlorosilane and ammonia
15天前
已完结
CFD analysis of surface saturation effects on wafer-scale uniformity in Si3N4 LPCVD
17天前
已完结
On the Mechanism of Silicon Nitride Chemical Vapor Deposition from Dichlorosilane and Ammonia
17天前
已完结
Silicon nitride films deposited from SiH2Cl2NH3 by low pressure chemical vapor deposition: kinetics, thermodynamics, composition and structure
17天前
已完结
皖公网安备34019202002308
