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60 积分 2024-08-29 加入
The Impact of Well-Edge Proximity Effect on PMOS Threshold Voltage in Various Submicron CMOS Technologies
4小时前
待确认
Impact of the TiN electrode deposition on the HfO2 band gap for advanced MOSFET gate stacks
4个月前
已完结
Modulation of the effective work function of TiN metal gate for PMOS application
4个月前
已完结
Atomic layer annealing for modulation of the work function of TiN metal gate for n-type MOS devices
4个月前
已完结
From plastic to elastic stress relaxation in highly mismatched SiGe/Si heterostructures
6个月前
已完结
Strain, stress, and mechanical relaxation in fin-patterned Si/SiGe multilayers for sub-7 nm nanosheet gate-all-around device technology
6个月前
已完结
Control of TiN oxidation upon atomic layer deposition of oxides
6个月前
已完结
Investigation of ALD or PVD (Ti-rich vs. N-rich) TiN metal gate thermal stability on HfO2 high-K
6个月前
已完结
Dopant-defect interactions in highly doped epitaxial Si:P thin films
7个月前
已完结
Characterization of Titanium Silicide (TiSi[sub 2]) for Complementary Metal Oxide Semiconductor
7个月前
已完结
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