Lv2
130 积分 2024-05-31 加入
N7 logic via patterning using templated DSA: implementation aspects
3小时前
已完结
Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly
3小时前
已完结
Directed self assembly for advanced nodes: material and process innovations for P24LS
3小时前
已完结
Make a core engine ready to empower high quality multi-beam mask writer for N2 node and beyond
30天前
已完结
Hybrid metrology for hot spot prediction in lithographic patterning
1个月前
已关闭
Ion Beam Etching as a Disruptive Integration Strategy for Advanced Logic: From T2T Scaling to Tilted 3D-IC Routing
1个月前
已完结
Patterning challenges for beyond 3nm logic devices: example of an interconnected magnetic tunnel junction
1个月前
已完结
A comparison of SALELE with traditional lithography and anti-spacer technology
2个月前
已关闭
Quantitative metrology for anti-spacer patterning process development
2个月前
已关闭
Sub-20nm tip-to-tip enabled by anti-spacer patterning
2个月前
已完结
皖公网安备34019202002308
