| 标题 |
Mass spectrometric studies of plasma etching of silicon nitride |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena 作者:P. E. Clarke; D. Field; A. J. Hydes; D. F. Klemperer; M. J. Seakins 出版日期:1985-11-01 |
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(2025-6-4)