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76 积分 2025-05-26 加入
A Comparison of Cl2 and HBr/Cl2-Based Polysilicon Etch Chemistries: Impact on SiO2 and Si Substrate Damage
14天前
已完结
Role of silicon source in surface evolution of Al alloy during HBr/Cl2-based plasma etching
15天前
已完结
Kinetics and Mechanisms of Reactive-Ion Etching of Si and SiO2 in a Plasma of a Mixture of HBr + O2
1个月前
已完结
Cryogenic plasma etching for SiO2/SiN dielectric films: a mini review
2个月前
已完结
Comparative study of CF4 + X + He (X = C4F8 or C4H2F6) plasmas for high aspect ratio etching of SiO2 with ACL mask
2个月前
已完结
Review of sustainable plasma processing for next-generation electronics: from 3D integration to advanced displays
2个月前
已完结
Effect of O2 dilution and substrate temperature on the etching of SiNx in a C4F6/Ar plasma
3个月前
已完结
Hydrogen bond-mediated activation of HF in SiO2 thermal dry etching: A first-principles study of catalytic additives
3个月前
已完结
Formation and stability of ammonium fluorosilicate during etching of SiN x in CH2F2/Ar and SF6/H2 plasmas
3个月前
已完结
Hydrogen bond-mediated activation of HF in SiO2 thermal dry etching: A first-principles study of catalytic additives
3个月前
已关闭
α-Synuclein Early-Oligomers Regulate Self-Assembly through Nucleation and Liquid–Liquid Phase Separation
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