Lv61
2018 积分 2024-09-02 加入
Chemical mechanical polishing on K9 glass using developed aluminum-doped monodisperse spherical ceria abrasives
10天前
已完结
Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism
15天前
已完结
Enhanced polishing performance and tribo-chemical removal mechanism of sapphire wafers under gas-assisted CMP (GA-CMP)
22天前
已完结
Material removal mechanism of non-resonant vibration-assisted magnetorheological finishing of silicon carbide ceramics
27天前
已完结
Enhanced polishing performance and tribo-chemical removal mechanism of sapphire wafers under gas-assisted CMP (GA-CMP)
1个月前
已完结
Surface damage induced by oxidation in silicon wafer polishing: Mechanisms and mitigation strategies
1个月前
已完结
Pseudo-random path planning for rotationally symmetric aspheric polishing based on the removal of regional overlap rate
1个月前
已完结
pH-driven interfacial bond dynamics enable high-efficiency low-damage polishing of fused silica with CeO2 based slurries
1个月前
已完结
Fabrication and Application of Gel-Forming CeO2 Fixed Abrasive Tools for Quartz Glass Polishing
1个月前
已完结
Preparation of Chlorine-doped CeO2 Abrasive and Investigation of Chemical-Mechanical Polishing Properties
1个月前
已完结
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