Lv6
2768 积分 2024-09-02 加入
Polishing-velocity effects on material removal and subsurface damage in SiO₂–Si nano-polishing: A molecular dynamics study
2天前
已完结
Tribological mechanisms of ultrasonic-assisted magnetorheological polishing: Regulation of interface wear uniformity and multi-scale error suppression
2天前
已完结
Scratching properties of 4H–SiC single crystal after oxidation under different conditions
9天前
已完结
Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution
13天前
已完结
Synergistic effect of physics and chemistry on material removal of fused quartz in nanoparticle jet polishing
13天前
已完结
Atomic surface of fused silica and polishing mechanism interpreted by molecular dynamics and density functional theory
22天前
已完结
Novel full-frequency material removal models verified by polishing experiments using three kinds of polishing pads performed on a developed five-axis polisher
1个月前
已完结
A distinctive material removal mode in chemical mechanical polishing besides chemical bonding and mechanical plowing: Shear slipping
1个月前
已关闭
Dissolution Characteristics at the Quartz–Water Interface in Different Environments: Insights from Molecular Dynamics Simulations
2个月前
已完结
Study on PCD tool wear in pulsed laser assisted turning Al-50wt % Si alloy
2个月前
已完结
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