Lv3
352 积分 2025-03-14 加入
Reducing CFx residue from Etching Process by Optimizing Post Plamsa Treatment
10小时前
已完结
Residual Clamping Force and Dynamic Random Access Memory Data Retention Improved by Gate Tungsten Etch Dechucking Condition in a Bipolar Electrostatic Chuck
10小时前
已完结
In-situ Cleaning of Post-etch Byproducts by Manipulating Dechucking Environment Gas in Silicon Etch Process
10小时前
已完结
Etch Properties of TiN Thin Film in Metal–Insulator–Metal Capacitor Using Inductively Coupled Plasma
1个月前
已完结
Role of NO in highly selective SiN/SiO2 and SiN/Si etching with NF3/O2 remote plasma: Experiment and simulation
4个月前
已完结
Highly selective etching of silicon nitride over silicon and silicon dioxide
4个月前
已完结
Silicon etching in NF3/O2 remote microwave plasmas
4个月前
已完结
Remote plasma etching of silicon nitride and silicon dioxide using NF3/O2 gas mixtures
4个月前
已完结
Vertically stacked gate-all-around Si nanowire transistors: Key Process Optimizations and Ring Oscillator Demonstration
4个月前
已完结
Vertically Stacked Gate-All-Around Si Nanowire CMOS Transistors with Reduced Vertical Nanowires Separation, New Work Function Metal Gate Solutions, and DC/AC Performance Optimization
4个月前
已完结
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