| 标题 |
Cryogenic etching characteristics of SiO2, SiN, and a-C films with HF/fluorocarbon-containing plasmas |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A 作者:Yusuke Imai; Shih-Nan Hsiao; M. Sekine; Michael K. T. Mo; Nikolay Britun; et al 出版日期:2026-08-26 |
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(2025-6-4)