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Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering
2小时前
求助中
The erosion groove effects on RF planar magnetron sputtering
2小时前
已完结
Evolution Mechanism of Sputtered Film Uniformity with the Erosion Groove Size: Integrated Simulation and Experiment
2小时前
已完结
Fundamentals first, technology second
8天前
已完结
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