Lv4
460 积分 2025-08-14 加入
Analysing surface roughness evolution in thin films
1个月前
已完结
Overview of atomic layer etching in the semiconductor industry
1个月前
已完结
磁控溅射Ge薄膜的结晶特性研究
1个月前
已完结
Effects of plasma treatment in the tungsten process for chemical vapor deposition titanium nitride barrier film beyond nanometer technology
1个月前
已完结
Study of metal organic chemical vapor deposition TiN thin films in real structures
1个月前
已完结
Impact of plasma treatment time on MOCVD-TiN properties and on the electrical performance of deep contacts
2个月前
已完结
Tungsten voids improvement by optimizing MOCVD-TiN barrier layer plasma treatment at 28 nm technology node
2个月前
已完结
Integration of CVD W on MOCVD TiN
2个月前
已完结
Scaling of Ion Transport Based on Frequency and Pressure in a Parallel-Plate RF Glow Discharge
2个月前
已完结
Investigation of the plasma treatment in a multistep TiN MOCVD process
2个月前
已完结
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