Lv41
426 积分 2022-04-18 加入
Optical investigation of stacked absorber type black border on EUV mask
2小时前
已完结
Mask Materials and Designs for Extreme Ultra Violet Lithography
6天前
已完结
Optical materials deposited using ion beam sputtering
11天前
已关闭
Ion-enhanced growth in planar and structured Mo/Si multilayers
14天前
已完结
Electrospun Poly-L-Lactic Acid Scaffolds Surface-Modified via Reactive Magnetron Sputtering Using Different Mixing Ratios of Nitrogen and Xenon
19天前
已完结
Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings
19天前
已完结
Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior
20天前
已完结
Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas
1个月前
已关闭
Improvements in MoSi EAPSM CD bias and iso-dense linearity plasma etch results utilizing design of experiments process optimization of Gen III ICP plasma source
1个月前
已完结
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