| 标题 |
Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope |
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| DOI | |
| 其它 |
期刊:Applied Physics Express 作者:Tsuyoshi Amano; S. Iida; R. Hirano; T. Terasawa; Hidehiro Watanabe; et al 出版日期:2013-04-01 |
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(2025-6-4)