Lv2
110 积分 2022-12-01 加入
Diffusion barrier properties of atomic layer deposited TiSiN films
20天前
已完结
Promoter-driven recrystallization affording highly textured ruthenium
30天前
已完结
Oxidation degradation of TiN electrodes in DRAM capacitors and mitigation through AlN insertion
2个月前
已关闭
Lattice dynamics and dielectric properties of incipient ferroelectricTiO2rutile
3个月前
已完结
Hf-Based High-κ Dielectrics: A Review
3个月前
已完结
Engineering the dielectric properties of t -HfO 2 thin films using first-principles calculations
3个月前
已完结
The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application
4个月前
已完结
Reduction of Leakage Current and Enhancement of Dielectric Properties of Rutile-TiO2 Film Deposited by Plasma-Enhanced Atomic Layer Deposition
4个月前
已完结
Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone
4个月前
已完结
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