| 标题 |
Interface formation and reactions at Ta–Si and Ta–SiO2 interfaces studied by XPS and ARXPS |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Electron Spectroscopy and Related Phenomena 作者:M Zier; S Oswald; R Reiche; M Kozlowska; K Wetzig 出版日期:2004-07-01 |
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(2025-6-4)