| 标题 |
Effect of Ag thickness on growth behavior, composition distribution and figure of merit of ITO/Ag/ITO multilayer films deposited by direct current magnetron sputtering for transparent conducting electrode applications |
| 网址 | |
| DOI | |
| 其它 |
期刊:Materials Science in Semiconductor Processing 作者:Alex Ching-Huan Lee; Mei-Hui Lin; Horng-Hwa Lu 出版日期:2026-03-01 |
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(2025-6-4)