| 标题 |
Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes |
| 网址 | |
| DOI |
10.1117/12.2583786
doi
|
| 其它 |
期刊:Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV 作者:George A. Antonelli; Nick Keller; Troy Ribaudo; Franklin J. Wong; Wenmei Ming; et al 出版日期:2021-02-22 |
| 求助人 | |
| 下载 |
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(2025-6-4)