| 标题 |
Printing verification of the improved performance of low-n mask with sub-resolution grating (SRG) in high-NA EUVL |
| 网址 | |
| DOI |
10.1117/12.3091543
doi
|
| 其它 |
期刊:Optical and EUV Nanolithography XXXIX 作者:Inhwan Lee; Joern-Holger Franke; Guillaume Libeert; Nick Pellens; Vicky Philipsen; et al 出版日期:2026-04-10 |
| 求助人 | |
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(2025-6-4)