| 标题 |
In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor |
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| DOI | |
| 其它 |
期刊:Journal of vacuum science & technology 作者:Jan‐Willem J. Clerix; Golnaz Dianat; Annelies Delabie; Gregory N. Parsons 出版日期:2023-03-30 |
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(2025-6-4)