| 标题 |
High-Mobility IZO Thin-Film Transistors Enabled by Precise Hydrogen Control Using a SiO2–Al2O3 Supercycle via Plasma-Enhanced Atomic Layer Deposition |
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| DOI | |
| 其它 |
期刊:ACS Applied Materials & Interfaces 作者:Sunghwan Park; Seong-In Cho; Hwa Young Kim; Sang-Hee Ko Park; Jong Beom Ko 出版日期:2025 |
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