| 标题 |
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science and Technology 作者:John A. Thornton 出版日期:1974-07-01 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人或该文件上传人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)