| 标题 |
Formation of a Nanoscale SiO2Capping Layer on Photoresist Lines with an Ar/SiCl4/O2Inductively Coupled Plasma: A Modeling Investigation |
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| DOI | |
| 其它 |
期刊:Plasma Processes and Polymers 作者:Stefan Tinck; Efrain Altamirano-Sánchez; Peter De Schepper; Annemie Bogaerts 出版日期:2013-11-18 |
| 求助人 | |
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(2025-6-4)