| 标题 |
The effect of γ-ray irradiation on the adsorption properties and chemical stability of AMP/SiO2 towards Cs(I) in HNO3 solution |
| 网址 | |
| DOI | |
| 其它 | Zhang, XX (Zhang, Xiaoxia) [1] ; Wu, Y (Wu, Yan) [1] ; Chen, BC (Chen, Baocai) [2] ; Wei, YZ (Wei, Yuezhou) |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时,文件已从服务器自动删除,无法下载。 |
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(2025-6-4)