| 标题 |
Atomic Layer Etching of HfO2 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and HF |
| 网址 | |
| DOI | |
| 其它 |
期刊:ECS Journal of Solid State Science and Technology 作者:Younghee Lee; Jaime Dumont; S. George 出版日期:2015-01-01 |
| 求助人 | |
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(2025-6-4)